Replication of sub-100 nm structures using h- and s-PDMS composite stamps
نویسندگان
چکیده
منابع مشابه
Generation of 30-50 nm structures using easily fabricated, composite PDMS masks.
This communication demonstrates an approach to generate simple nanostructures with critical dimensions down to 30 nm over cm2-sized areas using composite PDMS masks. These masks were patterned with feature sizes down to 100 nm. When used in phase-shifting lithography, these masks generated arrays of structures in photoresist with line widths as small as 30 nm, slots in metal with features down ...
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ژورنال
عنوان ژورنال: Microsystem Technologies
سال: 2013
ISSN: 0946-7076,1432-1858
DOI: 10.1007/s00542-013-2043-1